| 摘要 |
[Task] The invention enables uniformly etching a surface of a sample with an improved repeatability, and etching at a low cost without requiring any large-scale equipment. [Means for Solving the Problem] In an electron spectroscopy analytical apparatus ( 1 ) for executing an analysis of a composition, a chemical state and the like of a surface of a sample ( 4 ) or in a depth direction thereof by irradiating an X-ray to the sample ( 4 ) from a high-energy particle irradiating unit ( 6 ) within a vacuum chamber ( 2 ) under a vacuum atmosphere, and detecting a kinetic energy of electrons emitted from the sample ( 4 ) by an electric energy analyzer ( 7 ) on the basis of a photoelectric effect, the surface of the sample ( 4 ) is ion-etched by irradiating a fullerene ion beam to the surface of the sample ( 4 ) from an ion gun ( 8 ) before irradiating the high-energy particle to the sample ( 4 ).
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