| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a means and an apparatus for manufacturing a large photonic crystal in a short time by using a simply structured optical system in a so-called holographic lithography method by which the three-dimensional photonic crystal is manufactured by generating interference fringes by allowing a plurality of luminous fluxes interfere in a photosensitive material. <P>SOLUTION: The method of manufacturing the three-dimensional photonic crystal is for manufacturing the three-dimensional photonic crystal in which the refractive index of light varies with a three-dimensional period, whereby the photosensitive material 3 of which the refractive index varies according to the intensity of radiated light is exposed to the interference of two luminous fluxes from different three directions, latent image groups 17, 18 and 19 composed of a plurality of wall-shaped latent images 16 having a predetermined thickness are formed in three directions, respectively, the different refractive indices are generated at the part where three latent image groups 17, 18 and 19 are superimposed and at the other parts, thus variation in the refractive index with the three-dimensional period is formed in the photosensitive material 3. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
