发明名称 METHOD AND DEVICE FOR MEASURING METAL OXIDATION DEGREE OF METAL VAPOR-DEPOSITED FILM, AND METHOD AND DEVICE FOR MEASURING FILM THICKNESS
摘要 PROBLEM TO BE SOLVED: To enable the oxidation degree of a metal vapor-deposited film to be measured independently of a film thickness. SOLUTION: In a metal vapor-deposited film forming device, a film (3) for vapor deposition uncoiled from an uncoiling roll (2) is coiled around a cooling roll (4) at a predetermined angle, vapor-deposited with a metal vapor, and coiled around a coiling roll (5), and oxygen is fed to the metal vapor from upstream and downstream sides. A surface reflectance sensor (10) and a transmittance sensor (11) are arranged between the coiling roll (5) and the cooling roll (4) close to the surface of the film (3) for vapor deposition, and the oxidation degree of the metal in the metal vapor-deposited film is calculated from the detected values of the surface reflectance sensor (10) and the transmittance sensor (11) without depending on the thickness of the metal vapor-deposited film. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008038198(A) 申请公布日期 2008.02.21
申请号 JP20060213696 申请日期 2006.08.04
申请人 SONY CORP 发明人 KISHISHITA HIROKI;SUDO HIROAKI;KOJIKA YUKIHIRO
分类号 C23C14/54;C23C14/56 主分类号 C23C14/54
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