发明名称 Projection objective for microlithographic projection exposure apparatus, has lens composed of lens elements which are arranged to follow each other along optical axis, where lens has curved lens surfaces put together by elements
摘要 <p>The objective has a lens (143) composed of a set of lens elements (143a-143d), which are arranged to follow each other along an optical axis (OA) in a mutually adjacent relationship. The lens has a set of curved lens surfaces put together by the lens elements made of intrinsically birefringent material e.g. magnesium spinel. The lens elements are made up of two pairs of lens elements having crystallographic cuts different from each other. The lens elements of each pair have same crystallographic cut and are arranged relative to each other with a rotary offset about the optical axis. Independent claims are also included for the following: (1) a microlithographic projection exposure apparatus with an illumination device (2) a method for microlithographic manufacture of microstructured components.</p>
申请公布号 DE102006038398(A1) 申请公布日期 2008.02.21
申请号 DE20061038398 申请日期 2006.08.15
申请人 CARL ZEISS SMT AG 发明人 KRAEHMER, DANIEL;RUOFF, JOHANNES
分类号 G02B13/14;G02B3/00;G03F7/20 主分类号 G02B13/14
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