发明名称 PHASE CHANGE MEMORY DEVICE AND FABRICATION METHODS OF USING THE SAME
摘要 <p>A phase-change memory device and a manufacturing method thereof are provided to improve a retention characteristic by using a phase-change material comprising Sb of 22.2 or more. A phase-change material is formed between a bottom electrode(110) and a top electrode(130). The phase-change material comprises Sb of 22,2 at.% or more in a phase diagram of a ternary system containing Ge, Sb and Te. The phase-change material comprises Ge of 16.6 to 22.2 at.%, Sb of 22.2 to 41.6 at.% and Te of 41.6 to 55.5 at.%. The phase-change material contains at least one selected from the group consisting of B, C, N and O.</p>
申请公布号 KR20080016120(A) 申请公布日期 2008.02.21
申请号 KR20060077808 申请日期 2006.08.17
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 BAE, JUN SOO;HORII HIDEKI;PARK, JU CHUL;KUH, BONG JIN;YI, JI HYE;KO, HAN BONG;SHIN, HEE JU;PARK, DOO HWAN
分类号 H01L27/115 主分类号 H01L27/115
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