发明名称 SEMICONDUCTOR DEVICE, AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To increase a structure region of a bit line structure to take advantage of a chip area efficiently. SOLUTION: A plurality of bit line structures BL, a source shunt line structure SH1, and a dummy line structure SH2 are juxtaposed on the same layer at a predetermined width and at a predetermined interval; and a via plug structure Via2 is configured on the source shunt line structure SH1. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008042001(A) 申请公布日期 2008.02.21
申请号 JP20060215690 申请日期 2006.08.08
申请人 TOSHIBA CORP 发明人 SUZUKI ATSUHIRO
分类号 H01L21/3205;H01L21/8247;H01L23/52;H01L27/10;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/3205
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