| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a carbon layer on a substrate. SOLUTION: A substrate having a structured surface including a sidewall is prepared. Plasma is formed from atmosphere containing gaseous hydrocarbon compound. The substrate is processed using the plasma and, thereby, a carbon layer is deposited on the structured surface of the substrate. According to one embodiment, a ratio of hydrogen and carbon in the gaseous hydrocarbon compound is less than 2:1. According to another embodiment, the atmosphere includes a gaseous added compound having affinity to hydrogen bond. Thus, the amount of reactive hydrogen of the plasma decreases and, carbon deposition in the sidewall of the structured surface is improved thereby. COPYRIGHT: (C)2008,JPO&INPIT
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