| 摘要 |
PROBLEM TO BE SOLVED: To provide a design method of a CP aperture mask capable of shortening a drawing time of a plurality of kinds of devices. SOLUTION: A plurality of character patterns CPij (j=1, 2, ...) are acquired for each of a plurality of devices Di(i=1, 2, ...)(S1). The value of shot number reduction effect is calculated using a function whose variable is Eij and Ni or a function whose variable is Eij and Pi when numerizing the shot number reduction effect when drawing a device Di using CPij for each of CPij of device Di, where Ni is the number of chips if chips containing device Di are tiled on a wafer, Eij is efficiency for CP with CPij being used, and Pi is a parameter correlated to the number of chips (S2). A specified number of CPs are selected in such order as the highest value of shot number reduction effect is selected first, among a plurality of CPij of a plurality of devices Di (S3). COPYRIGHT: (C)2008,JPO&INPIT
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