发明名称 NOVEL METHOD FOR FORMING METAL PATTERN AND FLAT PANEL DISPLAY USING THE METAL PATTERN
摘要 <p>A method for manufacturing a metal line and a flat display device using the same are provided to obtain high resolution metal line patterns by implementing a metal line having low contact resistance using coating, exposition, and plating. Liquids having photocatalyst compounds, metal catalytic compounds, and photo-sensitizers are coated on a substrate and a photo metal catalytic layer is formed. By selectively exposing the photo metal catalytic layer, a potential pattern for crystal growth nucleus is obtained. The plating on the potential pattern is executed using one or more metals and then a metal crystal is grown, thereby obtaining metal patterns with one or more layers.</p>
申请公布号 KR20080016025(A) 申请公布日期 2008.02.21
申请号 KR20060077561 申请日期 2006.08.17
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 NOH, CHANG HO;CHO, SUNG HEN;SONG, KI YONG;BYK TAMARA;T.V. GAEVSKAYA;V.G. SOKOLOV
分类号 H01L21/027;H01L29/786 主分类号 H01L21/027
代理机构 代理人
主权项
地址