| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist undercoat film material for a multilayer resist process, in particular, the material for a two-layer resist process or a three-layer resist process, which has the function to neutralize an amine-based contaminant from a substrate to reduce adverse effect such as a resist pattern footing on an overcoat resist. <P>SOLUTION: The resist undercoat film material for forming an undercoat film of a chemically amplifying photoresist layer comprises a crosslinking polymer and a thermal acid generator expressed by general formula (1a):R<SP>1</SP>CF<SB>2</SB>SO<SB>3</SB><SP>-</SP>(R<SP>2</SP>)<SB>4</SB>N<SP>+</SP>which generates an acid by heating at 100°C or higher. A resist undercoat film substrate is provided which has a resist undercoat film formed by using the resist undercoat film material. <P>COPYRIGHT: (C)2008,JPO&INPIT |
