发明名称 SEMICONDUCTOR CRYSTAL GROWTH APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor crystal growth apparatus for conducting the mixed exhaust processes by supplying a mixture of ammonium and an organic nitrogen raw material. SOLUTION: The semiconductor crystal growth apparatus 1 for enabling vapor phase growth of a nitride semiconductor by supplying ammonium and organic nitrogen raw material x to a reaction furnace 2 includes a heat treatment unit 3, for previously conducting heat treatment to the organic nitrogen raw material x to be exhausted by bypassing the reaction furnace 2. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008041805(A) 申请公布日期 2008.02.21
申请号 JP20060211882 申请日期 2006.08.03
申请人 HITACHI CABLE LTD 发明人 NARITA YOSHINOBU;KANEDA NAOKI
分类号 H01L21/205;C23C16/44;C30B25/14;C30B29/38 主分类号 H01L21/205
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