发明名称 |
SEMICONDUCTOR CRYSTAL GROWTH APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor crystal growth apparatus for conducting the mixed exhaust processes by supplying a mixture of ammonium and an organic nitrogen raw material. SOLUTION: The semiconductor crystal growth apparatus 1 for enabling vapor phase growth of a nitride semiconductor by supplying ammonium and organic nitrogen raw material x to a reaction furnace 2 includes a heat treatment unit 3, for previously conducting heat treatment to the organic nitrogen raw material x to be exhausted by bypassing the reaction furnace 2. COPYRIGHT: (C)2008,JPO&INPIT
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申请公布号 |
JP2008041805(A) |
申请公布日期 |
2008.02.21 |
申请号 |
JP20060211882 |
申请日期 |
2006.08.03 |
申请人 |
HITACHI CABLE LTD |
发明人 |
NARITA YOSHINOBU;KANEDA NAOKI |
分类号 |
H01L21/205;C23C16/44;C30B25/14;C30B29/38 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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地址 |
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