发明名称 Sawing method for a wafer
摘要 The present invention relates to a sawing method for a wafer. The sawing method of the invention comprises: (a) providing a wafer, the wafer having an active surface and a back surface, the active surface having a plurality of sawing lines; (b) coating a protection layer on the active surface and the sawing lines; (c) taping a grinding tape on a surface of the protection layer; (d) grinding the back surface of the wafer to thin the wafer; (e) removing the grinding tape; and (f) sawing the wafer to form a plurality of dice. Whereby, the problems of die cracking, die scratching, die contamination and peeling of the surface of the sawing lines can be avoided.
申请公布号 US2008045124(A1) 申请公布日期 2008.02.21
申请号 US20070785710 申请日期 2007.04.19
申请人 CHU FU-TANG;CHUNG CHI-YUAM;TENG JI-PING 发明人 CHU FU-TANG;CHUNG CHI-YUAM;TENG JI-PING
分类号 B24B1/00 主分类号 B24B1/00
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