发明名称 |
Continuous sloped phase edge architecture fabrication technique using electron or optical beam blur for single phase shift mask ret |
摘要 |
A phase shift mask may include boundaries between phase shift regions with continuous sloped phase edges. The continuous sloped phase edges may be produced by introducing a predetermined degree of defocus into a beam used during production of the mask to image the pattern on the mask. Such a phase shift mask may be "trimless", i.e., not require a corresponding binary "trim" mask for a second exposure to remove phase conflicts after exposure with the phase shift mask.
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申请公布号 |
US2008044768(A1) |
申请公布日期 |
2008.02.21 |
申请号 |
US20070894795 |
申请日期 |
2007.08.20 |
申请人 |
INTEL CORPORATION |
发明人 |
VERNON MATT F.;CHENG WEN-HAO |
分类号 |
G03C5/29;G03C5/00;G03F1/00;G03F9/00 |
主分类号 |
G03C5/29 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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