| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an illumination system which utilizes available illumination light with high light yield and is characterized by low uniformity, ellipticity, and telecentricity errors. <P>SOLUTION: The disadvantage is overcome by an illumination system having a light source which emits radiation with wavelengths of less than or equal to 193 nm. The illumination system includes an optical component having a first facet with a field raster element in a plane provided with a first illumination, and provides a controlling equipment for illumination of an incompletely-illuminated region raster element which has at least a portion thereof unilluminated. The equipment can control uniformity of a second illumination in a region on an object plane. <P>COPYRIGHT: (C)2008,JPO&INPIT |
