| 发明名称 |
INTEGRATED CIRCUIT SYSTEM HAVING STRAINED TRANSISTOR |
| 摘要 |
An integrated circuit system is provided including forming a circuit element on a wafer, forming a stress formation layer on the wafer, protecting a portion of the stress formation layer, and irradiating the wafer for modification of a stress value of an unprotected portion of the stress formation layer.
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| 申请公布号 |
US2008044967(A1) |
申请公布日期 |
2008.02.21 |
| 申请号 |
US20060465799 |
申请日期 |
2006.08.19 |
| 申请人 |
CHARTERED SEMICONDUCTOR MANUFACTURING LTD.;SAMSUNG;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
TEH YOUNG WAY;WIDODO JOHNNY;PARK JAE EUN;BELYANSKY MICHAEL P. |
| 分类号 |
H01L21/8238 |
主分类号 |
H01L21/8238 |
| 代理机构 |
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