Optical system for semiconductor lithography, has adjusting unit positioning optical component, where contact points of adjusting unit at optical component is selected, such that no moments develop at optical component

摘要

The system has an adjusting unit (2) for positioning an optical component (1) e.g. lens, at defined positions along an optical axis of the system and for adjusting different operating configurations of the system. The adjusting unit is formed such that it is changeable between the different operating configurations within a time period of less than 500 milli seconds. Contact points (3) of the adjusting unit at the optical component are selected in such a manner that no moments develop at the optical component. An independent claim is also included for a method for adjusting operating configurations of an optical system for a semiconductor lithography.