发明名称 |
PHOTOCURABLE RESIN COMPOSITION |
摘要 |
<p>A photocurable resin composition comprising a (meth)acrylate ester with a sulfur content of no more than 5 ppm is disclosed. This photocurable resin composition is preferably used in a coating material or an adhesive, or in an adhesive layer or a protective layer formed on top of the metal layer of an optical disk.</p> |
申请公布号 |
EP1794199(A4) |
申请公布日期 |
2008.02.20 |
申请号 |
EP20050785253 |
申请日期 |
2005.09.16 |
申请人 |
HITACHI CHEMICAL CO., LTD. |
发明人 |
HAYASHI, KATSUNORI;KOBAYASHI, AKIHIRO;KAMEI, JUNICHI |
分类号 |
C08F20/16;G11B7/24;G11B7/253;G11B7/2534;G11B7/254;G11B7/2542;G11B7/257;G11B7/2575 |
主分类号 |
C08F20/16 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|