METHOD OF ION BEAM TREATMENT OF DIELECTRIC SURFACE AND DEVICE FOR IMPLEMENTING THIS METHOD

摘要

A method of an ion beam treatment of a dielectric surface and a device for implementing the same are provided to obtain high efficiency by minimizing generation of defects on the dielectric surfaces to be treated. A flow of directional ions and a flow of directional electrons are formed on a dielectric surface(1) in order to neutralize positive charges. The flow of directional electrons is formed by a plasma cathode discharge using a tunnel type electric field. A part of magnetic flux(6) of the tunnel type electric field crosses simultaneously the dielectric surface to be treated and a cathode surface to be treated. A cathode(4) is made of graphite and/or boron. The part of the magnetic flux of the tunnel type electric field corresponds to at least 20 percent of the entire part of the magnetic flux.