发明名称 CONTROL OF X-RAY BEAM SPOT SIZE
摘要 Control of x-ray beam spot size is provided to control effective spot size and angle information of radiation on a target area on the surface of a sample. Control of x-ray beam spot size includes the steps of: directing a radiation beam(27) to impinge on a target area(28) on the surface of a sample(22) along a beam axis at each of a plurality of different elevation angles in sequence; determining, for each of the different angles, offset of the beam in a direction transverse to the beam axis; applying a transverse correction to at least one of the beam and the sample to compensate for the offset, while directing the radiation beam to impinge on the target area at each of the different elevation angles; and sensing the radiation(29) scattered from the sample while the beam irradiates the target area at each of the different elevation angles subject to the transverse correction.
申请公布号 KR20080015735(A) 申请公布日期 2008.02.20
申请号 KR20070081583 申请日期 2007.08.14
申请人 JORDAN VALLEY SEMICONDUCTORS LTD. 发明人 MAZOR ISAAC;BERMAN DAVID
分类号 G01N23/02;G21K5/00 主分类号 G01N23/02
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