发明名称 De-focus uniformity correction
摘要 A system and method for uniformity correction such that a defined uniformity specification is met while minimizing a set of selected constraints is provided. The system includes illumination optics, an opto-mechanical correction system, a contrast device, projection optics and a correction module coupled to the correction system. The correction system includes a plurality of adjustable components such as fingers. The correction module is configured to determine adjustments to the components to correct uniformity. A method for discretizing the continuous intensity integral is also provided. The illumination slot is divided into a grid having multiple grid points. "pupils" are then superimposed onto the grid. Multiple second grids are also defined. Each ""pupil"" is mapped to a second grid such that the center of the second grid is coincident with the ""pupil"" center. The continuous intensity integral is then discretized using the first grid, plurality of second grids, and ""pupil"" mappings.
申请公布号 US7333176(B2) 申请公布日期 2008.02.19
申请号 US20060647419 申请日期 2006.12.29
申请人 ASML HOLDING N.V. 发明人 WIENER ROBERTO B.;KREMER ALEXANDER;STONE ELIZABETH;ZIMMERMAN RICHARD
分类号 G03B27/52;G03B27/42;G03B27/72 主分类号 G03B27/52
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