发明名称 Memory with split gate devices and method of fabrication
摘要 A DRAM fabricated on an SOI substrate employing single body devices as memory cells without relying on a field through the insulative layer of the SOI is described. Floating body devices are defined by orthogonally disposed lines with both a front gate and back gate for each body being formed on the insulative layer.
申请公布号 US7332779(B2) 申请公布日期 2008.02.19
申请号 US20060350230 申请日期 2006.02.08
申请人 INTEL CORPORATION 发明人 CHANG PETER L. D.
分类号 H01L29/94;H01L21/336;H01L29/786 主分类号 H01L29/94
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