发明名称 Method and apparatus for imprint pattern replication
摘要 Provided is a method and system for imprinting a pattern formed on a surface of an imprint mask into a substrate. A method includes deforming at least one of the surface of the imprint mask and a surface of the substrate to produce a deformed surface having an arc therein. A clamping pressure is applied to bring the deformed surface into intimate contact with the other surface, the applied pressure substantially flattening the deformed surface. The applied clamping pressure is released to separate the two surfaces.
申请公布号 US7331283(B2) 申请公布日期 2008.02.19
申请号 US20040012598 申请日期 2004.12.16
申请人 ASML HOLDING N.V. 发明人 SEWELLL HARRY
分类号 B41M1/10 主分类号 B41M1/10
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