发明名称 Plasma processing apparatus and method thereof
摘要 A nozzle head NH of a plasma processing apparatus comprises an annular inner holder 3 , an annular inner electrode 11 surrounding this holder 3 , an annular outer electrode 21 surrounding this electrode 11 , and an annular outer holder 4 surrounding this electrode 21 . The inner holder 3 is provided with a plurality of bolts 7 spacedly arranged in the peripheral direction and adapted to push the inner electrode 11 radially outwardly. The outer holder 4 is provided with a plurality of bolts 8 spacedly arranged in the peripheral direction and adapted to push the outer electrode 21 radially inwardly. Owing to this arrangement, the operation for disassembling, assembling and centering the annular electrodes 11, 21 can be carried out with ease.
申请公布号 US7332039(B2) 申请公布日期 2008.02.19
申请号 US20040547078 申请日期 2004.03.04
申请人 SEKISUI CHEMICAL CO., LTD. 发明人 NOGAMI MITSUHIDE;MIYAMOTO EIJI
分类号 H01L21/306;H05H1/24;B01J19/08;C23C16/00;C23C16/509;H01J37/32;H01L21/3065 主分类号 H01L21/306
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