SUBSTRATE PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

A substrate processing apparatus comprises a chamber in which a processing space for processing a substrate is defined and which is made of metal, at least one rod-shaped heating body which heats the substrate, and a tube body which houses the heating body and is made of a material different from that of the chamber. The outer diameter on the processing space side of the tube body in a through part in which the tube body passes through the wall of the chamber is set to a dimension smaller than that on the outer side of the chamber of the tube body in the through part.