POLISHING GRAIN AND POLISHING SLURRY USING THE SAME AND METHOD OF MANUFACTURING THE SAME

摘要

A method for preparing an abrasive particle, an abrasive particle prepared by the method, a method for preparing a polishing slurry by using the abrasive particle, and a polishing slurry prepared by the method are provided to increase the size of crystal and to control the growth of abnormal particles generated under the calcination at high temperature. A method for preparing an abrasive particle comprises the steps of (S110) drying a cerium precursor; (S120) filling the dried cerium precursor into a container and sealing it; and (S130) calcining the dried cerium precursor under the sealed state. Preferably the cerium precursor comprises cerium carbonate; the drying is carried out at a temperature lower than the temperature where a crystal starts to grow; and the calcination is carried out at a temperature of 500-900 deg.C.