LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

A lithographic apparatus and a method for manufacturing a device are provided to stabilize temperature of a substrate table by controlling a cover plate individually formed on the substrate table and temperature of the cover plate. A substrate table(WT) supports a substrate(W). A projection system(PL) projects a modulated radiation beam to the substrate. A liquid supplying system provides liquid to a region between the projection system and the substrate during an exposing process. A cover plate is located at an external side of a radius direction of the substrate during an exposing process. The cover plate is physically separated from the substrate table so that a surface thereof faces the projection system adjacent to the substrate. A heat insulator reduces heat transmission between the cover plate and the substrate table in order to provide a thermal shielding of the substrate table by the cover plate. The thermal insulator includes a low thermal conductive burl at which the cover plate mounted.