LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

A lithographic apparatus and a method for manufacturing a device are provided to reduce and prevent bubbles from being generated in dipping liquid by reducing size or volume of a gap on a substrate table and/or covering the gap. An illuminator(IL) conditions a radiation beam(B). A support structure(MT) supports a patterning device(MA). The support structure is connected to a first position setting apparatus(PM). The position setting apparatus exactly positions the patterning device according to specific parameters. A substrate table(WT) holds a substrate(W) and is connected to a second position setting apparatus(PW). The second position setting apparatus exactly positions the substrate according to specific parameters. A projection system(PS) projects the pattern given to the radiation beam by the patterning device to a target unit(C) of the substrate.