| 摘要 |
<p>A lithographic apparatus is disclosed. The apparatus includes a source (5) for supplying hydrogen radicals (1), a guide (2) for use in conjunction with the source, for directing hydrogen radicals to an application surface (4) to be targeted by the hydrogen radicals. The guide is provided with a coating (8) having a hydrogen radical recombination constant of less than 0.2. In this way, the radicals can be transported with reduced losses and are able to better interact with remaining contaminants on application surfaces, such as mirror surfaces.</p> |
