| 摘要 |
<p>A stage device (10) comprising a wafer holding member (14) on which a wafer (12) is placed, a Z-axis support base (18) liftably supporting the Z-axis member (16) of the water holding member (14), a Rz support base (22) rotatably supporting the Z-axis support base (18) through a bearing (20), and an XY table (24) on which the Rz support base (22) is mounted. The fixed elements (36a) of Z-axis actuators (36) are fixed onto the flat surface part (34) of the Rz support base (22), and the movable elements (36b) thereof are fixed to both ends of the horizontal member (14b) of the wafer holding member (14). The pair of Z-axis actuators (36) are controlled so as to simultaneously impart driving forces to the horizontal member (14b) of the wafer holding member (14). In this case, since the reaction of the driving forces of the Z-axis actuators (36) are received by the Rz support base (22) and the XY table (24), the occurrence of vibration by the reaction can be suppressed.</p> |
