PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

摘要

A plasma processing apparatus is disclosed which enables to conduct a preferable plasma processing while suppressing damage to an object to be processed which is caused by plasma generation. The plasma processing apparatus comprises at least a plasma processing chamber wherein a plasma process is performed on an object to be processed, an object-holding means for placing the object within the plasma processing chamber and a plasma generating means for generating a plasma in the plasma processing chamber, and the plasma generating means can be intermittently supplied with energy.