发明名称 GASBEHANDLUNGSEINRICHTUNG UND VERFAHREN ZU DEREN HERSTELLUNG UND DEREN VERWENDUNG
摘要 A gas treatment device (200) comprises a housing (128); a substrate (126) disposed within the housing; a retention device (122) disposed between the housing (128) and the substrate (126), wherein the retention device (122) comprises a plurality of individual spring elements, and a break, wherein the plurality of individual spring elements exert a compressive force against the housing (128) and the substrate (126) such that the substrate is retained within the housing; and a support (148) material disposed between the housing (128) and the substrate (126).
申请公布号 AT384860(T) 申请公布日期 2008.02.15
申请号 AT20050076553T 申请日期 2005.07.07
申请人 DELPHI TECHNOLOGIES, INC. 发明人 HARDESTY, JEFFREY B.;BRUSH, DAGAN W.;RUTLAND, GORDON J.;LESHER, ERIC J.;THOMAS, STEPHEN M.;WYLAND, ROBERT N.;BOWERS, AMY S.
分类号 F01N3/28;B01D53/88 主分类号 F01N3/28
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