GASBEHANDLUNGSEINRICHTUNG UND VERFAHREN ZU DEREN HERSTELLUNG UND DEREN VERWENDUNG
摘要
A gas treatment device (200) comprises a housing (128); a substrate (126) disposed within the housing; a retention device (122) disposed between the housing (128) and the substrate (126), wherein the retention device (122) comprises a plurality of individual spring elements, and a break, wherein the plurality of individual spring elements exert a compressive force against the housing (128) and the substrate (126) such that the substrate is retained within the housing; and a support (148) material disposed between the housing (128) and the substrate (126).
申请公布号
AT384860(T)
申请公布日期
2008.02.15
申请号
AT20050076553T
申请日期
2005.07.07
申请人
DELPHI TECHNOLOGIES, INC.
发明人
HARDESTY, JEFFREY B.;BRUSH, DAGAN W.;RUTLAND, GORDON J.;LESHER, ERIC J.;THOMAS, STEPHEN M.;WYLAND, ROBERT N.;BOWERS, AMY S.