| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a groove forming method for stably and accurately forming a finer groove in a substrate. <P>SOLUTION: The groove forming method includes: applying an electron beam resist on a substrate to form a resist layer; applying an electron beam to the resist layer to expose the resist layer; developing the resist layer to form a linear opening having a predetermined width in the resist layer; forming a polymer membrane in the opening; continuously forming a high polymer aggregate having a width narrower than that of the opening in the opening along the longitudinal length of the opening; forming a groove of a width narrower than that of the opening in the substrate in the opening by using the aggregate as a mask; and removing the resist layer and the aggregate. <P>COPYRIGHT: (C)2008,JPO&INPIT |
