发明名称 |
Cleaning apparatus for cleaning a chamber used in manufacturing a semiconductor device and method of cleaning a chamber by using the same |
摘要 |
In a cleaning apparatus and a method of cleaning a chamber used in manufacturing a semiconductor device, a first plasma may be provided into a chamber to remove a first residue from an inner wall of the chamber where the first residue is attached. A second plasma may then be provided into the chamber to remove a second residue formed by the first plasma from an inside of the chamber where the second residue remains. The second residue formed by the first plasma used to clean the chamber may not pollute a semiconductor substrate located in the chamber.
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申请公布号 |
US2008035170(A1) |
申请公布日期 |
2008.02.14 |
申请号 |
US20070878493 |
申请日期 |
2007.07.25 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
BAEK KYE-HYUN;KANG JONG-HOON;KIM YONG-JIN;LIM YOUNG-SOO |
分类号 |
B08B6/00 |
主分类号 |
B08B6/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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