发明名称 Gas filling facility for photomask pod or the like
摘要 A gas filling system includes a work platform installed in a pod storage cabinet and defining an accommodation chamber for holding a photomask pod, a pod detaching mechanism disposed in one side of the work platform and controllable to unlock the locking members of the photomask pod for allowing removal of a cover member of the photomask pod from its support tray, and a displacement mechanism mounted in a second side of the work platform and controllable to separate the support tray and the cover member of the photomask pod for allowing filling of an inert gas into the accommodation chamber.
申请公布号 US2008035237(A1) 申请公布日期 2008.02.14
申请号 US20070889094 申请日期 2007.08.09
申请人 GUDENG PRECISION INDUSTRIAL CO., LTD. 发明人 PAN YUNG-SHUN
分类号 B65B3/04 主分类号 B65B3/04
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