| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a stage unit that is simplified, is further versatile, and has a high accuracy. <P>SOLUTION: The lithographic unit includes an illuminating system that controls a radiation beam, a patterning support that retains a patterning device for patternizing the radiation beam, a substrate support that retains a substrate, a projection system that projects the radiation beam with a pattern, an additional support, and a flexible line assembly that transmits at least any one of current, signal, and fluid. A first portion of the line assembly is extended between a base and the additional support, and a second portion is extended between the additional support and the patterning support or the substrate support. A first motor assembly generates a force in at least one direction and is coupled with any one of the patterning support and the substrate support. A second motor assembly generates a force in at least one direction and is coupled with the additional support. The first motor assembly includes the planar motor. <P>COPYRIGHT: (C)2008,JPO&INPIT |
