发明名称 GRADATION MASK AND METHOD FOR MANUFACTURING THE SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a gradation mask that can control transmittance from 0% to 100% and facilitates pattern formation, and to provide a method for manufacturing the mask. <P>SOLUTION: A light shielding component included in a light shielding layer that forms a light shielding region is carbon black; and the transmittance can be changed by increasing or decreasing the amount of carbon black as the light shielding component. A method for increasing or decreasing the concentration of carbon black as the light shielding component comprises changing the concentration of the carbon black included in the light shielding layer while keeping the same film thickness in different light shielding regions, and thereby, the transmittance is changed. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008032941(A) 申请公布日期 2008.02.14
申请号 JP20060205418 申请日期 2006.07.27
申请人 KURARAY CO LTD 发明人 KITANO TAKAHIRO;OGUSHI MASAYASU
分类号 G03F1/54;G03F1/56 主分类号 G03F1/54
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