| 摘要 |
PROBLEM TO BE SOLVED: To provide a nanoparticle deposition method and a nanoparticle deposition apparatus which can deposit nanoparticles on a substrate at a high deposition rate. SOLUTION: A substrate 2 held inside a vacuum vessel 10 is irradiated with nanoparticles, the nanoparticles 1 are heated during flying to be formed into droplets in which a part or the whole of the nanoparticles is melted, the droplet-shaped nanoparticles 1 are collided against the substrate 2 to be solidified, and the formed nanoparticles 1c are deposited on the substrate 2. The a droplet-shaped nanoparticles 1 have reduced recoil in the surface of the substrate 2, and can be deposited at a high deposition rate. COPYRIGHT: (C)2008,JPO&INPIT
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