发明名称 |
Method for high resolution patterning using soft X-ray, process for preparing nano device using the method |
摘要 |
A method for nano-scale high resolution patterning of self-assembled monolayer using soft X-rays is provided. The method involves forming an aromatic imine molecular layer having substitutents at its terminal rings on a substrate, selectively cleaving bonds to the substituents of the aromatic imine molecular layer, and hydrolyzing the aromatic imine molecular layer.
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申请公布号 |
US2008038542(A1) |
申请公布日期 |
2008.02.14 |
申请号 |
US20070717191 |
申请日期 |
2007.03.13 |
申请人 |
POSTECH FOUNDATION |
发明人 |
PARK JOON W.;LA YOUNG H.;MOON JOONG H.;KIM BONGSOO;KANG TAI H.;KIM KI J. |
分类号 |
B32B5/16;G03F7/075;G03F7/00;G03F7/004;G03F7/16;G03F7/20;H01L21/027;H01L21/033;H01L21/302 |
主分类号 |
B32B5/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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