发明名称 Method of fabricating a capacitor of a memory device
摘要 A capacitor of a memory device, and a method of fabricating the same, includes a lower electrode electrically coupled to a doping region of a transistor structure, the lower electrode having a metal electrode and a metal oxide electrode, a ferroelectric layer covering and extending laterally along the lower electrode, and an upper electrode formed on the ferroelectric layer.
申请公布号 US2008038846(A1) 申请公布日期 2008.02.14
申请号 US20070878868 申请日期 2007.07.27
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK YOUNG-SOO;LEE JUNG-HYUN;CHO CHOONG-RAE;KOO JUNE-MO;KIM SUK-PIL;SHIN SANG-MIN
分类号 H01L21/8246;H01L27/105;H01L21/02;H01L27/10;H01L27/115 主分类号 H01L21/8246
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