发明名称 |
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device method |
摘要 |
In a scatterometry apparatus having an illumination aperture stop, a field stop is provided at an intermediate image to control the spot size on the substrate. The field stop may be apodized, e.g. having a transmissivity in the form of a trapezium or a Gaussian shape.
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申请公布号 |
US2008037134(A1) |
申请公布日期 |
2008.02.14 |
申请号 |
US20060501911 |
申请日期 |
2006.08.10 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BOEF ARIE JEFFREY MARIA DEN;SHMAREV YEVGENIY KONSTANTINOVICH |
分类号 |
G06K9/00;G02B3/00;G02B9/00 |
主分类号 |
G06K9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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