| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a device for correcting a defect of a reticle pattern and a correction method by which correction accuracy of a defective pattern of a reticle is improved, the efficiency is improved to reduce a correction time, and productivity is increased as well as the cost can be reduced. <P>SOLUTION: The device for correcting a defect of a reticle pattern comprises: a lithography emulation system 48 having an optical emulation system 45; and a micromachining defect correction system 52 having a reticle defect correction mechanism 49 with a cantilever. As a defect of a reticle pattern can be corrected by the defect correction mechanism while in-situ observing a transferred image by the optical emulation system, the reticle pattern can be efficiently corrected while avoiding a problem such as excessive correction. <P>COPYRIGHT: (C)2008,JPO&INPIT |
