| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus which is excellent in a resolving force and a throughput. <P>SOLUTION: The exposure apparatus has the nozzle member located around the final optical element contained in a projection optical system; an opposing surface of a nozzle member which is opposed to a substrate positioned so as to oppose to the final optical element, has a supply port which is located substantially parallel to the surface orthogonal to the optical axis of the final optical element, and supplies the liquid to the clearance; and a first recovery port which is located far apart from the optical axis more than the supply port, and recovers the liquid from the clearance. The portion of the opposing surface located between the supply port and the first recovery port contains the first portion which is substantially parallel to the surface orthogonal to the optical axis, and the second portion which is located between the supply port and the first portion and includes an inclined surface. A first interval between the first portion and the substrate is larger than a second interval between the supply port and the substrate. The closer the inclined surface approaches the optical axis, the closer the inclined surface approaches the substrate. <P>COPYRIGHT: (C)2008,JPO&INPIT |
