| 摘要 |
PROBLEM TO BE SOLVED: To provide a color solid-state imaging element manufacturing method for efficiently manufacturing a color filter having superior smooth surface properties, by forming the color filter with a step by a single exposure and development procedure process. SOLUTION: A planarizing layer 21 and a green photosensitive layer 31g are formed on a semiconductor substrate 11, with a photoelectric conversion element 12 formed thereon. Pattern exposure is performed, by using a transmittance control exposure mask 50g, and a patterning treatment is performed, such as development so that the green filter 31G is formed with a step. The blue color filter 31B, the read color filter 31R, and a microlens 41 are formed successively and the color solid-state imaging element is manufactured. COPYRIGHT: (C)2008,JPO&INPIT |
