| 摘要 |
A loading table and a plasma processing apparatus having the same are provided to improve the uniformity of electric field strength in a plasma and to enhance an in-plane uniformity of a plasma process to a substrate. A conductive member is connected to a high-frequency power source, and serves as an ion supply electrode. Dielectric layers(32,34) are formed to cover a center portion of an upper surface of the conductive member to make a high-frequency electric field, which is applied to plasma via a substrate, uniform. An electrostatic chuck(33) is laminated on the dielectric layer, and has an electrode film(35) satisfying specific conditions. The dielectric layer is formed in a columnar shape, and a thickness of a circumferential part of the dielectric layer is smaller than a thickness of a central part of the dielectric layer.
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