发明名称 OBLIQUE INCIDENCE INTERFEROMETER
摘要 PROBLEM TO BE SOLVED: To provide a high-accuracy and high-speed oblique incidence interferometer for enabling a measurement in an environment such as a processing field in which a vibration exists. SOLUTION: The oblique incidence interferometer irradiates a light at a predetermined angle to a normal of a measured surface of a measured object 20, and measures a reflection light from the measured object 20. The oblique incidence interferometer includes: a light flux splitting element 14 for splitting the light from a light source 11 into a measurement light irradiated to the measured object 20 and a reference light as a measurement reference; a light flux combining element 16 for combining the measurement light reflected from the measured object 20 and the reference light after they become orthogonal to each other in the deflection direction; a three-way splitting prism 33 for splitting the combined light into a plurality of split lights; imaging sections 35A-35C for imaging a plurality of interference pattern images formed by a plurality of the split lights; a quarter-wavelength plate 31 disposed on one of the entrance side and the exit side of the three-way splitting prism 33; and polarization plates 34A-34C disposed on the imaging plane side of the imaging sections 35A-35C. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008032690(A) 申请公布日期 2008.02.14
申请号 JP20070141556 申请日期 2007.05.29
申请人 MITSUTOYO CORP 发明人 KAWASAKI KAZUHIKO;SUZUKI YOSHIMASA;OTAO REIYA
分类号 G01B9/02;G01B11/24 主分类号 G01B9/02
代理机构 代理人
主权项
地址