| 发明名称 |
POSITIVE RESIST PROCESSING LIQUID COMPOSITION AND LIQUID DEVELOPER |
| 摘要 |
<p>Disclosed is a positive resist processing liquid composition which is composed of an aqueous solution containing a quaternary ammonium hydroxide represented by the following general formula (I). In the formula, R<SUB>1</SUB> and R<SUB>3</SUB> independently represent a methyl group, and R<SUB>2</SUB> represents an alkyl group having 12-18 carbon atoms.</p> |
| 申请公布号 |
WO2008018580(A1) |
申请公布日期 |
2008.02.14 |
| 申请号 |
WO2007JP65689 |
申请日期 |
2007.08.10 |
| 申请人 |
KANTO KAGAKU KABUSHIKI KAISHA;MURAKAMI, YUTAKA;ISHIKAWA, NORIO |
发明人 |
MURAKAMI, YUTAKA;ISHIKAWA, NORIO |
| 分类号 |
G03F7/38;G03F7/32;H01L21/027;H01L21/304 |
主分类号 |
G03F7/38 |
| 代理机构 |
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