发明名称 |
METHODS AND SYSTEMS FOR CONTROLLING CRITICAL DIMENSIONS IN TRACK LITHOGRAPHY TOOLS |
摘要 |
<p>A method of controlling wafer critical dimension (CD) uniformity on a track lithography tool includes obtaining a CD map for a wafer. The CD map includes a plurality of CD data points correlated with a multi-zone heater geometry map. The multi-zone heater includes a plurality of heater zones. The method also includes determining a CD value for a first heater zone of the plurality of heater zones based on one or more of the CD data points and computing a difference between the determined CD value for the first heater zone and a target CD value for the first heater zone. The method further includes determining a temperature variation for the first heater zone based, in part, on the computed difference and a temperature sensitivity of a photoresist deposited on the wafer and modifying a temperature of the first heater zone based, in part, on the temperature variation.</p> |
申请公布号 |
WO2008019362(A2) |
申请公布日期 |
2008.02.14 |
申请号 |
WO2007US75344 |
申请日期 |
2007.08.07 |
申请人 |
SOKUDO CO., LTD.;MICHAELSON, TIM;BEKIARIS, NIKOLAOS |
发明人 |
MICHAELSON, TIM;BEKIARIS, NIKOLAOS |
分类号 |
B05C11/00;H01L21/66 |
主分类号 |
B05C11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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