| 摘要 |
PROBLEM TO BE SOLVED: To reduce even a small amount of light scattered from an edge when the uneven edge is scanned on a work (wafer), and to reduce the detection sensitivity of foreign substances and prevent a detector from degrading. SOLUTION: A surface inspecting apparatus includes a means, constituted so as to orient the movement direction of a work (wafer)-holding mechanism by 180 degrees and the irradiation direction of a laser beam that is irradiated obliquely. COPYRIGHT: (C)2008,JPO&INPIT
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