发明名称 FOREIGN MATTER/FLAW-INSPECTING DEVICE AND FOREIGN MATTER/FLAW INSPECTION METHOD
摘要 PROBLEM TO BE SOLVED: To solve the problem, wherein although it is necessary to enhance the resolving power of aθencoder, in order to enhance the resolving power (accuracy) of flaw detection, there is a limit to the resolving power of the encoder that can be improved and it is difficult to improve the positional accuracy of flaw detection. SOLUTION: This foreign matter/flaw-inspecting device is provided with a means, constituted so as to make the sampling time interval of A/D conversion for performing the flaw detection smaller than the time interval of angle data (θencoder) obtained, when a wafer is rotated and transferred to measure the place where the peak position thereof exists, within one unit (to measureΔθ) from the sampled A/D conversion result. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008032582(A) 申请公布日期 2008.02.14
申请号 JP20060207343 申请日期 2006.07.31
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 ANDO MASAAKI;MATSUI SHIGERU;TAKAHASHI KAZUO
分类号 G01N21/956 主分类号 G01N21/956
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