| 摘要 |
PROBLEM TO BE SOLVED: To provide a capacitance-type sensor with its sensitivity enhancement materialized through the use of an uncomplicated manufacturing process. SOLUTION: This capacitance-type sensor includes a substrate 3 with its part functioning as a diaphragm M and a back electrode B with these confronting each other, and includes: a space formation area X with a portion of the substrate 3 functioning as the diaphragm M separated from the back electrode B by a space 11; and a spacer formation area Y with a portion of the substrate 3 not functioning as the diaphragm M separated from the back electrode B by a spacer member S. This sensor is formed so that the substrate 3 and the back electrode B confront each other in parallel therewith in the formation area Y while the substrate 3 and the back electrode B confront each other in parallel therewith in the formation area X, and that a space between the substrate 3 and the back electrode B in the formation area Y is larger than a space between the substrate 3 and the back electrode B in the formation area X. COPYRIGHT: (C)2008,JPO&INPIT
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